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【Standard News】Notice on Holding Group Standard Review Meetings for "Testing Method for Dislocation Density of Gallium Oxide Single Crystal","β-Phase Gallium Oxide Homoepitaxial Wafer", and "Non-Destructive XRT Detection of Defects in Gallium Oxide Materials"

日期:2025-06-10阅读:91

Dear experts and relevant units:

      In accordance with the "Management Measures for Group Standards of China Electronics Materials Industry Association", The association has collected the group standard projects for the year of 2025 from the relevant units in the industry and completed the preliminary review. Now, it sincerely invites the experts and representatives of the units concerned to attend the review meeting for the group standard project approval to be held in Kaihua, Zhejiang Province on June 12th and 13th, 2025. Meanwhile, the representatives of the units that are interested in applying for the group standard are also welcome to attend the meeting as observers.

      At the same period of this time, the review meeting of two group standards, namely "Test Method for Dislocation Density of Gallium Oxide Single Crystal" and "β-phase Gallium Oxide Homoepitaxial Epitaxial Wafer", will also be held. Please have all the experts and representatives attending the meeting send the reply slip of participation to the email 444599312@qq.com before June 4th.

 

1.Organizers

Host Organizer: China Electronic Materials Industry Association

Executive Organizer: Semiconductor Materials Industry Association of China Electronic Materials Industry Association,

                                 Zhejiang HuaSheng Mold Technology Co., Ltd.

2.Tentative Schedule Arrangement