【Domestic News】Academician Hao Yue Leads the “Chip” Frontier: Empowering Innovation in Wide-Bandgap Semiconductors to Build a Strong Foundation for the Integrated Circuit Talent Pool

      Recently, at the invitation of Academician Shi Yi, Dean of the Chien-Shiung Wu College, Freshman College, Nanjing University, Academician Hao Yue of the Chinese Academy of Sciences—an internationally renowned expert in microelectronics and professor at Xidian University—delivered a special lecture at the “Freshman Lecture Hall” entitled “Cultivating Innovative Talent from the Perspective of Integrated Circuit Chips.” The lecture was attended by Zhang Jincheng, Member of the Standing Committee of the Party Committee and Vice President of Xidian University; Shi Linmiao, Party Secretary and Executive Vice Dean of the Freshman College of Nanjing University; Chen Lili, Deputy Party Secretary and Vice Dean; together with more than 300 faculty members and students of the Freshman College. The lecture was chaired by Liu Bin, Dean of the School of Electronic Science and Engineering at Nanjing University.

      Academician Hao Yue has long been dedicated to scientific research and talent cultivation in microelectronics and solid-state electronics. He has achieved systematic and innovative results in the fields of wide-bandgap semiconductor materials and devices, microwave and millimeter-wave semiconductor devices, as well as novel devices and materials for integrated circuits. While achieving outstanding research accomplishments, he has consistently shown deep concern for education and the growth of young students, not only leading the forefront of scientific research but also serving as a mentor and role model in their development.

      The lecture focused on the fundamental task of fostering virtue through education. Academician Hao Yue pointed out that building a strong education system is a systematic endeavor that requires coordinated efforts to balance national strategic needs with public welfare, as well as knowledge acquisition with all-round personal development. In view of the broad development prospects and real-world challenges facing the semiconductor industry, he emphasized that integrated circuit chips constitute a key core technology vital to national economic growth and security. Breakthroughs can be achieved through innovations in core process devices, design technologies, and novel semiconductor materials, thereby shaping the future direction of microelectronics and integrated circuit technologies.

      Building on this, Academician Hao Yue used the development history of “chip pathways” in wide-bandgap semiconductors as an example to elaborate on their unique advantages in high-temperature, high-voltage, and high-current-density applications. He systematically showcased China’s strategic layout and major breakthroughs in the field, illustrating through vivid examples how practical technological support and talent competitiveness can be effectively achieved. The lecture aimed to inspire young students to strengthen their ideals and convictions and to courageously shoulder the responsibilities of the era.

      During his visit to Nanjing University, Academician Hao Yue, accompanied by Academician Shi Yi and Dean Liu Bin, toured and provided guidance on the construction of the National Integrated Circuit Industry–Education Integration Innovation Platform. During the visit, both sides engaged in in-depth discussions on the achievements in integrated circuit discipline development at Nanjing University, the cultivation model for top-tier innovative talents, progress in tackling key core technologies, and pathways for the commercialization of scientific and technological achievements. Academician Hao highly commended Nanjing University’s practical efforts in addressing regional development needs and empowering high-quality development of the integrated circuit industry. This visit further strengthened inter-university communication and exchange in integrated circuit discipline construction and talent cultivation, laying a foundation of shared understanding for future collaborative scientific research and innovation.

      The alliance continues to focus on building a robust talent ecosystem and establishing a comprehensive talent database, firmly regarding talent as the primary resource driving industrial development, as well as the core support for overcoming critical technological bottlenecks and achieving industrial transformation and upgrading. Academician Hao Yue’s recent series of exchange activities during his visit to Nanjing University provided valuable guidance for higher education talent cultivation, combining both theoretical depth and practical orientation, and built a solid bridge for inter-university collaborative education and joint scientific research. This aligns closely with the alliance’s long-term focus on talent development. By building a talent database, the alliance aims to gather and channel more industry professionals with innovative potential and practical capability, bridging the critical gap between university talent cultivation and industry needs, and establishing a coordinated “university–enterprise–alliance” mechanism for talent development and deployment.

      Looking ahead, the alliance will continue to deepen collaboration with universities, research institutes, and leading enterprises, integrating high-quality educational and industrial resources, and improving talent matching and service systems. This will facilitate the precise placement and full utilization of outstanding talent, laying a solid human-resource foundation for achieving key technological breakthroughs and high-quality development in China’s integrated circuit industry.