【Conference News】Synergy and Collaboration for a Shared Ecosystem | Asian Gallium Oxide Alliance Deeply Engages in FINE2026 Future Industry New Materials Expo

Event Overview

      From June 10 to 12, the 2026 Future Industry New Materials Expo (FINE2026) was successfully held at the Shanghai New International Expo Centre. As a major industry event focused on future industries and new materials innovation, this year's expo brought together more than 800 high-quality exhibitors from around the world. Covering over 40,000 square meters across Halls N1–N4, the event attracted enterprises, research institutes, and industry experts from across the industrial chain to discuss emerging industry trends and technological innovation.

      To promote exchange and collaboration within the advanced semiconductor sector, FINE2026 organized a dedicated Advanced Semiconductor Program centered on the development needs of future industries, highlighting third- and fourth-generation semiconductor materials such as gallium oxide, as well as advanced packaging technologies. Through exhibitions, technical forums, and industry exchange activities, the event provided a high-quality platform for collaboration while demonstrating the organizer's forward-looking vision in fostering future industrial ecosystems.

      As a cooperating partner of the expo, the Asian Gallium Oxide Alliance (AGOA) was deeply involved in the planning and organization of related activities. Working closely with the organizers, the Alliance co-organized the Gallium Oxide Session, focusing on crystal growth, epitaxy, device development, and industrial applications, while facilitating resource matching and cooperation across the gallium oxide value chain.

      During the event, the Alliance Secretary-General was invited to attend the opening ceremony and joined industry experts and corporate representatives in witnessing the official launch of the expo.

Gallium Oxide Session Highlights

Focusing on Key Breakthroughs for Industrialization

      As one of the featured activities of FINE2026, the Gallium Oxide Session, organized with the participation and support of AGOA, was incorporated into the Third-/Fourth-Generation Semiconductor Crystal Growth Forum. Discussions focused on material preparation, epitaxial growth, device development, and industrial applications, attracting broad participation from experts, company representatives, and professional attendees.

      The session featured five invited presentations covering key segments of the gallium oxide industrial chain.

      Hongji Qi, Chairman of Hangzhou Fujia Gallium Technology Co., Ltd., delivered a presentation entitled “Thoughts on Gallium Oxide Industrialization: Advancing Industry Adoption through 12-Inch Gallium Oxide Single-Crystal Technology Breakthroughs,” highlighting progress in large-diameter crystal growth and commercialization pathways.

      Jun Yuan, Research Fellow at Jiufengshan Laboratory, presented “Research on JFS Novel Gallium Oxide High-Voltage and High-Current Technologies,” introducing recent advances in power device technologies.

      Jiwei Jiang, Marketing Director of Hangzhou Garen Semiconductor Co., Ltd., shared “Industrialization Progress of Large-Size, High-Quality Gallium Oxide,” discussing large-scale crystal production and industrial deployment.

      Prof. Ziqiang Chen from The Hong Kong University of Science and Technology (Guangzhou) delivered “Recent Progress in Gallium Oxide Thin-Film Epitaxy and Doping,” highlighting developments in epitaxial materials research.

      Xiaodong Zhang, Research Fellow at the Suzhou Institute of Nano-Tech and Nano-Bionics, Chinese Academy of Sciences, presented “Gallium Oxide Thin-Film Epitaxy and Device Processing for Ultra-Wide-Bandgap Semiconductors,” introducing the latest advances in epitaxy and device fabrication technologies.

      From crystal growth and epitaxial preparation to device development and industrialization, the session systematically showcased progress across the gallium oxide value chain, reflecting China's growing technological capabilities and innovation momentum in this emerging field.

Industrial Chain Showcases

Deepening Ecosystem Collaboration

      In addition to the technical forum, numerous organizations from across the gallium oxide ecosystem participated in the exhibition, showcasing the latest achievements in materials, epitaxy, processing technologies, devices, testing, and characterization.

      Participating organizations included Jiufengshan Laboratory, Lanhe Technology（Shaoxing）Co.,Ltd, FreeSpirit Instruments (Shanghai)  Co., Ltd., B Beijing Orient Semi Co., Ltd., Suzhou Raphael Optech Co.,Ltd., Hangzhou Garen Semiconductor Co., Ltd., the Nano-Fabrication Platform of the Suzhou Institute of Nano-Tech and Nano-Bionics (CAS), Tanoxi Technology Co.,Ltd., Hangzhou Fujia Gallium Technology Co., Ltd., and the School of Integrated Circuit Science and Engineering at Tianjin University of Technology, among others. Their participation demonstrated the increasingly collaborative development of the gallium oxide industry ecosystem.

      AGOA also operated an exhibition booth during the event, engaging extensively with exhibiting companies, research institutions, and visitors. Throughout the expo, the Alliance conducted interviews and promotional activities for member organizations through corporate profiles, video recordings, and other media formats, helping members showcase technological achievements and strengthen industry visibility.

      Over the years, AGOA has continuously promoted technology exchange, resource integration, knowledge dissemination, and industrial collaboration, gradually establishing itself as a key connector across the gallium oxide ecosystem. During FINE2026, multiple member organizations participated in coordinated exhibition and forum activities under the Alliance's guidance, demonstrating the Alliance's practical effectiveness in industrial resource integration and ecosystem building.

      Through technical sessions, coordinated participation, and on-site networking, AGOA effectively facilitated resource aggregation and collaborative engagement while strengthening interaction among member organizations. The Alliance's ongoing efforts in information sharing, industry tracking, and resource services have also received sustained attention and positive feedback from its members.

Moving Forward Together

Promoting High-Quality Development of the Gallium Oxide Industry

      During FINE2026, AGOA maintained close collaboration with the organizers and industry stakeholders, jointly supporting the successful implementation of the Gallium Oxide Session and related activities. The event fostered an efficient and pragmatic atmosphere for industrial exchange while laying a solid foundation for future cooperation and resource matching. The collaborative mechanisms established throughout the event and the positive outcomes of on-site interactions were widely recognized by organizers and participants alike.

      Through networking activities, business discussions, and technical exchanges, the Alliance actively promoted gallium oxide materials and related technologies, helping strengthen communication and cooperation across the industrial chain. These efforts further enhanced industry understanding of gallium oxide technology developments and application prospects while broadening the scope and depth of industrial exchange.

Conclusion and Outlook

      Looking ahead, AGOA will continue to serve as a bridge connecting enterprises, universities, research institutes, and innovation organizations throughout the industrial chain. By advancing technology exchange, resource sharing, and industrial collaboration, the Alliance will continue to support the development of an open and mutually beneficial gallium oxide ecosystem and contribute new momentum to the high-quality development of fourth-generation semiconductor technologies.

      The future is already here. Through collaboration and shared progress, the Asian Gallium Oxide Alliance looks forward to working hand in hand with industry partners worldwide to accelerate technological innovation and industrialization in gallium oxide and achieve new milestones together.