【Member News】Exhibition Invitation: Garen Semiconductor Cordially Invites You to Attend the 20th National Conference On Crystal Growth And Materials

      During the conference, Professor Zhang Hui—jointly appointed by Zhejiang University and the Hangzhou International Science and Technology Innovation Center, and Chairman of Hangzhou Garen Semiconductor Co., Ltd.—will deliver an academic presentation titled "Progress and Challenges of Large-Size High-Quality Gallium Oxide Wafers" at the session on "Crystal Growth Technologies and Equipment." He will share relevant research progress with experts, scholars, and industry professionals, and jointly explore the opportunities and challenges in the development of large-size high-quality gallium oxide wafers.

      Crystal growth technologies and equipment represent a key focus area of this conference. Leveraging its deep expertise in gallium oxide crystal growth, Garen Semiconductor has independently developed a dedicated VB-method crystal growth equipment for gallium oxide. This equipment eliminates the need for frequent replacement of core components and flexibly accommodates the VB growth of 2- to 8-inch gallium oxide single crystals. It offers temperature control accuracy of ±0.1 °C with real-time data monitoring, and features a simple deployment process without requiring additional supply conditions such as process gases, compressed air, or cooling water. Additionally, the company provides a supporting growth process package, offering comprehensive support—from equipment to process—for universities, research institutes, and enterprises engaged in gallium oxide crystal growth research.

      Recognized for its technological innovation and strong market performance, this equipment recently received the CSPSD 2026 Outstanding Market Performance Award, reflecting the market's recognition of the technical strength and application value of Garen Semiconductor's dedicated VB-method gallium oxide crystal growth equipment.