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【Member News】Exhibition Invitation: Hangzhou Fujia Gallium Technology Co.,Ltd Cordially Invites You to Attend the 20th National Conference On Crystal Growth And Materials

日期:2026-08-21阅读:230

  The 20th National Conference on Crystal Growth and Materials will be held from August 22 to 25, 2026, at the South Suburb Hotel in Jinan, Shandong Province. Hangzhou Fujia Gallium Technology Co., Ltd. will showcase its premium exhibits at the conference, and its founder and chairman, Qi Hongji, has been invited to deliver a keynote presentation at a sub-forum.

  Organized by the Crystal Growth and Materials Division of the Chinese Ceramic Society and the Chinese Ceramic Society, and hosted by Shandong University, the conference will feature concurrent industry forums on crystal applications and equipment exhibitions. It is one of the largest and most academically prestigious comprehensive events in the field of crystal materials in China. We warmly welcome experts, scholars, and peers to visit the presentation and the Fujia Gallium exhibition booth for exchanges and guidance!

 

01 Invited Presentation

Presenter:
  Qi Hongji
  Founder & Chairman, Hangzhou Fujia Gallium Technology Co., Ltd.
  Director, Hangzhou Institute of Optics and Precision Mechanics
  Professor, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences

Title:
  "Preliminary Analysis on the Industrialization Status of Gallium Oxide Single Crystals and Epitaxial Materials"

Time:
  August 24, 2026 | 10:25–10:45

Venue:
  VIP Hall, 1st Floor, Blue Hall Building – Semiconductor Crystal Session B

 

02 Fujia Gallium Exhibits

1. Gallium Oxide Substrates

  Key Specifications:

  Size: 6-inch

  FWHM of double-crystal rocking curve: ≤150″

  Carrier concentration: 1×10¹⁶–10¹⁹ cm⁻³

 

2. Gallium Oxide Epitaxial Wafers

  Key Specifications:

  Size: 8-inch

  FWHM of double-crystal rocking curve: ≤150″

  Carrier concentration: 1–2×10¹⁶ cm⁻³

 

3. Gallium Oxide SBD Devices

  Key Specifications:

  Size: 6-inch

  Breakdown voltage: >1200 V

  Forward current: >5 A @ 3 V

 

4. EFG "One-Click Crystal Growth" Equipment

  Key Specifications:

  Maximum temperature: 2100 °C

  Heating type: Medium-frequency induction heating, 40 KW

  Maximum pulling height: 500 mm

  Weighing range: 20 kg / resolution 10 mg

  Operating atmosphere: Ar/O₂/CO₂ (configurable)

 

5. Intelligent VB-Method Crystal Growth Equipment

  Key Specifications:

  Maximum temperature: 1820 °C

  Heating type: Resistive heating (other heating options available)

  Rotation speed: 0.1–30 r/min

  Operating atmosphere: Air/Ar/O₂/CO₂ (configurable)

  Temperature accuracy: ±1 °C (±0.1 °C optional)

 

03 About Fujia Gallium

      Hangzhou Fujia Gallium Technology Co., Ltd. was established on December 31, 2019. The company takes “Bringing Better Materials to the World” as its vision, and commits to the industrialization of ultra-wide bandgap semiconductor gallium oxide materials.

      The company is a national high-tech enterprise, a Zhejiang Provincial specialized, refined, unique and innovative small and medium-sized enterprise, and a "quasi-unicorn" enterprise. It has undertaken many national and provincial-level projects from the Ministry of Science and Technology, National Development and Reform Commission, Ministry of Industry and Information Technology and other departments. It has obtained 65 authorized patents at home and abroad. It is the initiator and the first drafting unit of national standards in China’s gallium oxide industry. A series of important achievements achieved by the company in promoting gallium oxide industrialization have been reported and publicized by well-known media such as CCTV, People’s Daily, Xinhuanet, Science and Technology Daily, China Securities Journal and The Paper.