【International Papers】High-quality Cr₂O₃ - Ga₂O₃ solid solutions films grown by mist-CVD epitaxy

      Researchers from the Perfect Crystals LLC have published a dissertation titled "High-quality Cr₂O₃ - Ga₂O₃ solid solutions films grown by mist-CVD epitaxy" in Journal of Alloys and Compounds.

Abstract

      Micron-thick layers of (Cr_1-xGa_x)₂O₃ solid solutions were grown by modified mist chemical vapor deposition (mist-CVD) with three different Ga concentrations. Scanning electron microscopy (SEM) and X-ray diffraction (XRD) methods were used to analyze the quality of the films. They showed good crystallinity, homogeneity and coalescence of the samples. Solid solution contents estimation was performed via applying Vegard’s law to XRD data and by its results the highest reached Cr:Ga ratio is approximately 1:1. Transmission spectra of solid solutions demonstrated blue-shift of the absorption edge with increase of the Ga contents. Optical bandgap increased from 3.06 eV for undoped Cr₂O₃ sample to 3.73 eV for the layer with the highest Ga concentration.

Paper Link：https://doi.org/10.1016/j.jallcom.2024.174687