【Member News】Major Release | GAREN SEMI Introduces Dedicated Gallium Oxide Crystal Growth Equipment

Hangzhou GAREN SEMI Leads the Industry Innovation

Launched High-Performance Gallium Oxide Crystal Growth Equipment

      On September 20, 2024, Hangzhou GAREN SEMI Co., LTD. (hereinafter referred to as "GAREN SEMI"), as a pioneer in the field of ultra-wide band gap semiconductors, released the company's first Gallium Oxide dedicated crystal growth equipment. The equipment not only meets the needs of Gallium Oxide crystal growth, but also integrates multiple independent innovation technologies. It is a new milestone for GAREN SEMI to realize the closed-loop technology of Gallium Oxide single crystal materials.

01 What is the Difference of Gallium Oxide Crystal Growth Equipment?

      The importance of a reliable crystal growth equipment in the entire product manufacturing process is beyond doubt. They are not only an indispensable tool in the production process, but also a key factor in promoting technological progress and industrial upgrading. With the development of technology, the requirements for equipment are also increasing. Especially when growing new materials such as Gallium Oxide, the stability and specificity of equipment has become one of the key factors.

      As a new ultra-wide band gap semiconductor material, Gallium Oxide is regarded as a new hope in the field of power semiconductors with the characteristics of high withstand voltage, high power and low power consumption. However, most of the Gallium Oxide equipment is non-dedicated, meaning that these devices are not been specifically designed for the characteristics of Gallium Oxide material, which can result in reduced equipment reliability and increased production costs. For example, Gallium Oxide materials are prone to volatilize and decompose at high temperatures and require an oxygen-containing atmosphere, which is a great challenge for equipment and is not common in traditional semiconductor material growth.

02 What are the Advantages of Our Equipment?

      GAREN SEMI's dedicated Gallium Oxide crystal growth equipment meets the high temperature and high oxygen environment required for Gallium Oxide growth. The equipment is made of non-iridium crucible material and can operate in air atmosphere. The R&D team independently designed a unique composite temperature measurement technology and temperature control algorithm to ensure the stability, uniformity and consistency of the crystal growth process. The equipment realizes a fully automated crystal growth process, reduces manual intervention, and significantly improves production efficiency and crystal quality. The Gallium Oxide crystals produced by the equipment have cylindrical shapes, and by controlling the process, various large-sized single crystals with different crystal faces can be obtained. The equipment also supports the upgrade to larger single crystals to meet the growing needs of epitaxy technology and device applications. GAREN SEMI can also provide a variety of crystal face growth process files to achieve highly personalized product customization, to meet the needs of universities, research institutes, and enterprise customers for the scientific research and production of Gallium Oxide crystal growth.

03 Devoted to Solving the "Strangle-Hold " Technology Problems for the Country

      GAREN SEMI from the perspective of industrialization, improves the automation level of specialized equipment, greatly improves the controllability of Gallium Oxide crystal growth process, and significantly reduces the cost of single crystal preparation. This achievement not only reflects the technical strength of GAREN SEMI in the field of Gallium Oxide crystal materials, but also injects new vitality into the Gallium Oxide equipment industry. GAREN SEMI will continue to invest in research and development efforts to overcome the " strangle-hold" technical problems faced by China, and is committed to creating more significant value for customers.

Company Profile

      Hangzhou GAREN SEMI Co., Ltd. was established in September 2022, is a technology enterprise focusing on the research and development, production and sales of Gallium Oxide and other semiconductor materials. The company has created a new technology for Gallium Oxide single crystal growth, and has more than ten international and domestic invention patents, breaking through the monopoly and blockade of Western countries such as the United States and Japan on Gallium Oxide substrate materials. Based on solving the major national needs, GAREN SEMI will be deeply engaged in the continuous innovation of the Gallium Oxide upstream industry chain, and strive to provide product guarantee for the development of China's power electronics and other industries.

For more information about GAREN SEMI and its products

Please visit our official website: http://garen.cc/

Or contact us:

Mr. Jiang :15918719807

Email: jiangjiwei@garen.cc

Mr. Xia :19011278792

Email:xianing@garen.cc