【International Papers】Growth of α-Ga₂O₃ from Gallium Acetylacetonate under HCl Support by Mist Chemical Vapor Deposition

      Researchers from the Kochi University of Technology have published a dissertation titled "Growth of α-Ga₂O₃ from Gallium Acetylacetonate under HCl Support by Mist Chemical Vapor Deposition " in Nanomaterials.

Abstract

      α-Ga₂O₃ films were grown on a c-plane sapphire substrate by HCl-supported mist chemical vapor deposition with multiple solution chambers, and the effect of HCl support on α-Ga₂O₃ film quality was investigated. The growth rate monotonically increased with increasing Ga supply rate. However, as the Ga supply rate was higher than 0.1 mmol/min, the growth rate further increased with increasing HCl supply rate. The surface roughness was improved by HCl support when the Ga supply rate was smaller than 0.07 mmol/min. The crystallinity of the α-Ga₂O₃ films exhibited an improvement with an increase in the film thickness, regardless of the solution preparation conditions, Ga supply rate, and HCl supply rate. These results indicate that there is a low correlation between the improvement of surface roughness and crystallinity in the α-Ga₂O₃ films grown under the conditions described in this paper.

Figure 1. A schematic image of mist CVD system with multiple solution chambers, a mixing chamber, and a fine-channel reactor

Figure 2. (a) Typical XRD spectra of α-Ga₂O₃ film grown on c-plane sapphire substrate and (b) thickness estimation results using different methods (vertical axis T_L : thickness calculated from the spacings of Laue fringes in XRD spectra; horizontal axis T_E : thickness calculated from spectroscopic ellipsometry). The dashed line represents the same value on both the vertical and horizontal axes.

DOI：

https://doi.org/10.3390/nano14141221