【Epitaxy Papers】Etching of Ga₂O₃: an important process for device manufacturing

      Researchers from the Nanjing University of Posts and Telecommunications have published a dissertation titled "Etching of Ga₂O₃: an important process for device manufacturing" in Journal of Physics D: Applied Physics.

Abstract

      Etching plays a key role in processing and manufacturing electronic and optoelectronic devices. For ultra-wide bandgap semiconductor gallium oxide (Ga₂O₃), its etching investigations and evolution mechanism are still at the earlier stage, and some more research gumption should be invested. In this review, we make a summary on the etching of Ga₂O₃, including dry (plasma) etching, wet chemical etching, and photoelectrochemical etching, and discuss the etching results, existing problems, and feasible solutions, in order to provide guidance and advises for furtherly developing the Ga₂O₃ etching and Ga₂O₃-based electronic and optoelectronic devices.

DOI：

https://doi.org/10.1088/1361-6463/ad773d