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【International Papers】Electronic structure and properties of trapped holes in crystalline and amorphous Ga₂O₃

日期:2025-03-06阅读:80

      Researchers from the University College London have published a dissertation titled " Electronic structure and properties of trapped holes in crystalline and amorphous Ga2O3" in Physical Review B.

Abstract

      Structure and electronic properties of self-trapped holes were studied in both crystalline and amorphous Ga2O3 using density functional theory (DFT) and the nonlocal PBE0-TC-LRC density functional. Amorphous (a) Ga2O3 structures were generated using classical molecular dynamics and the melt-quench technique and further optimized using DFT. They exhibit an average density of 4.84g/cm3 and band gap around 4.3 eV. Calculations predict deep hole trapping in crystalline and amorphous phases with the hole-trapping energies in the amorphous structures being deeper than those found in the crystalline structure. In a−Ga2O3, trapped holes are localized around low-coordinated oxygen atoms (two or three coordinated). We predict the formation of stable hole bipolarons in both the crystalline and amorphous phases facilitated by the formation of O–O bonds with binding energies about 0.2 eV.

FIG. 1. Density distribution of a-Ga2O3 produced using the MD melt-quench approach with a range of CRs and after the geometry optimization using DFT for CR = 1 K/ps.

FIG. 2. The projected density of states (PDOS) with an inverse participation ratio (IPR) for each one-electron state for (a)  β-Ga2O3 and (b) one of the a-Ga2O3 structures. The IPR analysis shows no localization of states in the crystal and a strong localization at the top of the VB in the amorphous phase.

 

DOI:

doi.org/10.1103/PhysRevB.111.035203