【Member News】Empowering the Gallium Oxide Industry | Jingsheng Delivers 8-inch Czochralski and 6-inch VB Crystal Growth Furnaces

      Recently, Shandong Jingsheng Electronic Technology has achieved a series of major breakthroughs in the field of Gallium Oxide crystal growth equipment, with multiple key technological achievements successfully brought into practical application. The company’s fully self-developed 6-inch VB crystal growth furnace (based on non-iridium technology) and 8-inch Czochralski / Edge-defined Film-fed Growth (EFG) crystal growth furnace have successively completed full-process commissioning and rigorous testing, and have been successfully delivered to leading domestic universities and top substrate manufacturers. The successful delivery of these two core systems not only demonstrates Jingsheng’s sustained independent innovation capability in high-end crystal growth equipment, but also reflects the company’s equipment-driven approach to bridging scientific research validation and industrial application, accelerating the large-scale development of Gallium Oxide and wide-bandgap semiconductor materials.

Core Technologies Unlock New Pathways for Gallium Oxide Growth

      The delivered 6-inch VB crystal growth furnace is built upon Jingsheng’s independently developed non-iridium core technology and adopts the Vertical Bridgman (VB, crucible lowering) method as its fundamental principle. It is specifically designed for laboratory-scale research and validation of Gallium Oxide crystals, offering significant technical advantages:

Resistive Heating with Gradient Temperature Field for Precise Control

      By employing resistive heating, the furnace precisely establishes a gradient temperature field exceeding the melting point of Gallium Oxide, providing a stable and controllable thermal environment for crystal growth and meeting the demands of refined laboratory research.

Crucible Lowering Method Optimized for Gallium Oxide Growth

      Based on the classical VB (crucible lowering) method, the crucible containing the raw material is slowly lowered into the high-temperature furnace chamber. After complete melting, the crucible is uniformly lowered, enabling crystals to gradually grow at the bottom of the crucible with a stable and well-controlled growth process.

Non-Iridium Technology for Cost Reduction and High Compatibility

      Equipped with independently developed non-iridium core technology, the furnace overcomes conventional technical constraints. With low requirements for furnace atmosphere control, it eliminates the need for stringent environmental conditions, significantly reducing laboratory R&D and operational costs.

Decomposition Suppression for Enhanced Crystal Quality

      Addressing the tendency of Gallium Oxide to decompose, the furnace effectively suppresses decomposition through precise temperature field and process design, ensuring crystal integrity and quality from the source and providing robust equipment support for academic research on Gallium Oxide materials.

Advanced Technologies Driving Crystal Growth to New Heights

      As a new-generation flagship product of Jingsheng, the delivered 8-inch Czochralski crystal growth furnace integrates multiple independently developed innovations and is purpose-built for high-end crystal growth, fully meeting industrial-scale production requirements:

Top-Weight Automatic Diameter Control for High Precision

      Featuring top-weight automatic diameter control technology, combined with high-precision electronic weighing and proprietary software algorithms, the system enables real-time and accurate monitoring of crystal dimensions, ensuring uniformity and stability while addressing long-standing industry challenges related to dimensional deviation.

Dual-Mode Compatibility for Diverse Growth Requirements

      Leveraging years of technical expertise and mature high-temperature melt growth technologies, the furnace supports both Edge-defined Film-fed Growth (EFG) and Czochralski growth of Gallium Oxide crystals. This dual-mode capability provides greater process flexibility to meet diverse application scenarios.

CCD-Based Full-Process Monitoring with Intelligent Dynamic Control

      By innovatively integrating CCD camera-based dynamic imaging, the system enables comprehensive monitoring throughout the entire process—from temperature ramp-up to completion—capturing real-time changes in crystal diameter and melt level, and feeding them back to the control system for precise parameter adjustment, making crystal growth fully visible, controllable, and optimizable.

Multi-Dimensional Intelligent Detection Safeguarding the Entire Growth Cycle

      Beyond basic dimensional measurement, the furnace integrates multiple intelligent detection functions—including melt monitoring, melt temperature detection, crystal seed point detection, branching detection, and break detection—comprehensively monitoring critical growth stages, enabling timely anomaly warnings, and significantly improving yield and production efficiency.