【Member News】Garen Semiconductor Selected for the "2026 AI Innovation Applications Top 50" Exemplary Cases List

Figure 2 Excerpt from the 2026 AI Innovation Applications Top 50 Exemplary Cases List

      Core to this award is Garen Semiconductor’s exploration into the deep integration of AI technologies with its self-developed casting-based crystal-growth process. Crystal growth is an extremely complex procedure, where factors including furnace temperature and melt status are interrelated. For a long time, process tuning has largely depended on engineers’ experiential know-how. By adopting multi-agent AI collaboration technology, the monitoring, analysis and regulation of crystal-growth procedures have become more convenient and precise, delivering solid technical support for the transition of casting-method gallium oxide single crystals from laboratory R&D to large-scale production.

      This honor recognizes Garen Semiconductor’s innovative "Crystal-Growth Technology + AI" development path, stemming from the team’s years-long in-depth engagement in gallium oxide crystal growth. Starting from 2-inch up to 8-inch gallium oxide single-crystal substrates, followed by the completion and commissioning of a mass-production homoepitaxial production line compatible with 6-inch and 8-inch wafers, Garen Semiconductor has achieved continuous breakthroughs in core key technologies for fourth-generation semiconductors, accelerating the industrialization of gallium-oxide materials.

      Going forward, Garen Semiconductor will keep delving into ultra-wide-bandgap semiconductor materials, fully tap the application potential of AI technologies in crystal-growth processes, and contribute Garen-level strength to the development of China’s fourth-generation semiconductor industry.