【Domestic Papers】Design of lateral β-Ga₂O₃ MOSFET with PFOM of 769.42 MW/cm²

      Researchers from the Xi'an University of Science and Technology have published a dissertation titled " Design of lateral β-Ga₂O₃ MOSFET with PFOM of 769.42 MW/cm²" in Engineering Research Express.

Abstract

      The Power Figure of Merit (PFOM = Vbr2/Ron,sp) is used to evaluate the performance of Gallium Oxide (β-Ga₂O₃) power devices. In this study, a lateral β-Ga₂O₃ MOSFET device is designed. The effects of different gate lengths, gate-drain distances, and epitaxial layer doping concentrations on the device performance are investigated. It is found that when the gate length is 3μm, the breakdown voltage of the device is 3099V, which is approximately twice that of devices with other gate lengths. The PFOM of the device reaches 769.14 MW/cm². Furthermore, the breakdown voltage exhibits a trend of initially decreasing and then increasing with the increase of the gate-drain distance. When the gate-drain distance is 37μm, the breakdown voltage of the device reaches 4367V. Additionally, it is observed that the device performance is optimal when the epitaxial layer doping concentration is 2×10¹⁷cm^-3. This study provides a new approach for the design of Gallium Oxide power devices.

Paper Link：https://doi.org/10.1088/2631-8695/ad1fb5